Multilevel Distributed Embedded System for Control of the DC Magnetron Sputtering Process
نویسندگان
چکیده
منابع مشابه
Deposition of Al/Cu Multilayer By Double Targets Cylindrical DC Magnetron Sputtering System
A cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. The substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. The Al/ Cu multilayer film was deposited on the glass substrate at the following conditions: Working g...
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Sustaining a plasma in a magnetron discharge requires energization of the plasma electrons. In this work, Ohmic heating of electrons outside the cathode sheath is demonstrated to be typically of the same order as sheath energization, and a simple physical explanation is given. We propose a generalized Thornton equation that includes both sheath energization and Ohmic heating of electrons. The s...
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Key features of this waveform are the voltage boost period following each polarity transition and fast current rise time due to that boost. Ideally, the boost voltage would be adjustable. It is expected that adjusting the boost voltage will enable some tuning of the film properties, since it will effectively allow tuning of ion energy within the process. Additionally, adjustable duty, the ratio...
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Yttria-stabilized zirconia (YSZ, ZrO2:Y2O3) thin films were deposited by reactive DC magnetron sputtering with a high deposition rate from a metallic target of Zr/Y in an argon/oxygen atmosphere. Plasma parameters and composition analysis of the gas phase reveal that the sputtering process in the “compound” mode is reached for a 2.5 sccm oxygen flow rate. Deposition onto silicon in “metal” mode...
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ژورنال
عنوان ژورنال: Acta Universitatis Sapientiae Electrical and Mechanical Engineering
سال: 2017
ISSN: 2066-8910
DOI: 10.1515/auseme-2017-0009